发明名称 PRODUCTION OF SUPER PURE WATER AND SYSTEM THEREFOR
摘要 PURPOSE:To prepare pure water of high purity by removing residual impurities by means of vaporing water and then adsorbing and removing volatile gas in water vapor generated. CONSTITUTION:A vaporing chamber 51 is equipped with a heater 10 heating up raw water 100, and heated-up raw water 100 is discharged out of a nozzle 60 in the vaporing chamber 51 to self-evaporize raw water generating small water drops 110. From the surface of generated water drops 110, water vapor 200 and volatile gas 210 are generated. Water drops 110 are removed by hydrophobic porous material 31 (for example, porous sheet or non-woven cloth consisting of tetrafluoroethylene, polyphlene, etc.). Further, volatile gas 210 is removed by a remover 30, and water vapor 200 only is condensed on the surface of a cooling tube 80 to produce super pure water 500 of high purity.
申请公布号 JPS62191092(A) 申请公布日期 1987.08.21
申请号 JP19860030868 申请日期 1986.02.17
申请人 HITACHI LTD 发明人 KOSEKI YASUO;YAMADA AKIRA;KUROKAWA HIDEAKI;EBARA KATSUYA;TAKAHASHI SANKICHI
分类号 C02F1/04;H01L21/304 主分类号 C02F1/04
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