发明名称 COMPOSITIONS PHOTOCURABLE IN THE PRESENCE OF SENSITIZERS, AND THEIR USE
摘要 Novel compositions of matter which crosslink under the action of light and which contain (A) an aliphatically unsaturated polymerization product which is free of aromatic groups and which can contain structural elements of the formula I <IMAGE> (I) (B) a bisimide of the formula II <IMAGE> (II) and a sensitizer and, if desired, a further crosslinking agent, where R and R' are alkyl or together are tetramethylene, R1 is hydrogen, chlorine or methyl, Y and Y' are each -OH or together are -O- and R4 is alkylene, arylene or bis-arylene, are suitable, inter alia, for preparing printing plates or as photoresist materials.
申请公布号 DE3372550(D1) 申请公布日期 1987.08.20
申请号 DE19833372550 申请日期 1983.10.31
申请人 CIBA-GEIGY AG 发明人 BERGER, JOSEPH, DR.;LOHSE, FRIEDRICH, PROF. DR.
分类号 C08F2/00;C08F2/46;C08F2/48;C08F20/52;C08F22/40;C08F279/00;C08F279/02;C08F290/00;C08F291/00;C08F299/00;G03F7/038;(IPC1-7):G03F7/10 主分类号 C08F2/00
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