| 发明名称 |
ELECTRON-BEAM AND X-RAY SENSITIVE POLYMERS AND RESISTS |
| 摘要 |
<p>ELECTRON-BEAM AND X-RAY SENSITIVE POLYMERS AND RESISTS There are disclosed polymers, E-beam sensitive elements and resists obtained therefrom, that are more sensitive than 5 X 10-7 coulombs per cm2 when exposed to a 15 keV electron beam. The polymers are copolymers of either allyl or propargyl methacrylate and of an acrylate or methacrylate bearing an oxygencontaining heterocyclic ring.</p> |
| 申请公布号 |
CA1225789(A) |
申请公布日期 |
1987.08.18 |
| 申请号 |
CA19830429326 |
申请日期 |
1983.05.31 |
| 申请人 |
EASTMAN KODAK COMPANY |
发明人 |
TAN, ZOILO C.;DALY, ROBERT C. |
| 分类号 |
C08F20/00;C08F20/10;C08F20/26;C08F20/38;C08F220/26;C08F220/28;C08F220/32;C08F220/40;G03F7/038;(IPC1-7):C08F24/00 |
主分类号 |
C08F20/00 |
| 代理机构 |
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