OPPOSED TARGET TYPE SPUTTERING DEVICE

摘要

PURPOSE:To form a thin film having increased vertical magnetic anisotropic energy by providing the 2nd magnetic field generating means near the surface of a substrate and generating the magnetic field perpendicular to the substrate. CONSTITUTION:The vertical magnetic field H1 is generated between opposed targets 2 and 3 of a sputtering device 1 by the magnetic field generating means. The substrate 4 is disposed alongside the spacing between the targets 2 and 3. The 2nd magnetic field generating means 5 is fixedly disposed to the rear of the substrate 4 to generate the magnetic field H2 perpendicular to the surface of the substrate 4. A permanent magnet, etc., are used for the 2nd magnetic field generating means 5. The magnetic field on the surface of the substrate 4 is controlled by such device, by which the thin film having the large vertical magnetic anisotropic energy is formed.