发明名称 METHOD FOR REFORMING SUBSTRATE SURFACE
摘要 <p>PURPOSE:To shorten the production process and to prevent the deposition of dust, etc., by inserting a substrate into a gaseous mixture of a specified alcohol and an adhesive, simultaneously carrying out drying and surface reforming, and then forming a photoresist film. CONSTITUTION:The polished and cleaned substrate of glass, etc., is inserted into a processing vessel wherein a mixture of an alcohol for drying and an adhesive (e.g., hexamethyldisilazane) is heated and vaporized, and reformed. The photoresist film is subsequently formed. Since the two stages, drying and reforming, can be reduced to one stage by this method, the deposition of dust can be prevent in this process, and the productivity is improved.</p>
申请公布号 JPS62188043(A) 申请公布日期 1987.08.17
申请号 JP19860030182 申请日期 1986.02.14
申请人 VICTOR CO OF JAPAN LTD 发明人 MURATA TAKASHI
分类号 G03F1/00;G03F1/60;G11B7/26 主分类号 G03F1/00
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