发明名称 SUPPORTING ELECTRODE
摘要 PURPOSE:To securely and electrically connecting all wafers with plate electrodes to enable even plasma processing to be performed for all the wafers, by proving a pressing means for pressing the wafers on respective wafer-mounting planes of the plate electrodes. CONSTITUTION:Boat electrodes are composed by parallelly arranging four vertical plate electrodes 1, 1a, 1b and 1c made of graphite. A pair of hooks 6 are mounted below a notch 5 on respective facing planes of the plate electrodes. The wafer 7 is nearly vertically placed on the hooks 6, and then its upside is fixed to be pressed with a pressing jig (a pressing means) 8. Thus, the wafer 7 can be securely and electrically connected to the plate electrodes, and therefore thickness of films coated by a plasma CVD method among respective wafers can be prevented from becoming uneven.
申请公布号 JPS62188308(A) 申请公布日期 1987.08.17
申请号 JP19860028824 申请日期 1986.02.14
申请人 HITACHI MICRO COMPUT ENG LTD;HITACHI LTD 发明人 YONEMURA HITOSHI;KENO KOUZOU
分类号 H01L21/205;H01L21/31 主分类号 H01L21/205
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