| 摘要 |
PURPOSE:To increase a washing efficiency by juxtaposing an injection nozzle which blows washing water against the surface to be washed of a photomask or the like used for manufacture of a semiconductor device, and suction nozzles which suck in the washing water. CONSTITUTION:When a substance 3 to be washed is put with the surface 3a to be washed upside on a table 5, injection of washing water 21 is started from the injection port 13a of a first nozzle 13, vacuum suction is conducted by a second nozzle 15 and a third nozzle 17, and further blowing if air 23 of a prescribed pressure is started from a fourth nozzle 19. In this state, a nozzle mechanism 11 starts an operation of lowering toward the substance 3 to be washed, but this operation is stopped in the state wherein the fore end of the nozzle mechanism 11 is kept to be spaced by about two to several tens microns from the surface 3a to be washed, since the air 23 of the prescribed pressure is blown out of the fourth nozzle 19. Being kept in the above-stated positional relationship with the nozzle mechanism 11 in this way, the substance 3 to be washed is moved in the horizontal direction by the operation of an XY table 5 and subjected to a washing operation in the course of this movement. |
