发明名称 SEMICONDUCTOR DEVICE
摘要 PURPOSE:To prevent an electrode from generation of thermal fatigue even when it is pressure-welded by a method wherein the short-circuit generating between a base and an emitter is prevented by providing an emitter electrode on the first semiconductor layer, which becomes a base, through the intermediary of a polycrystalline silicon layer. CONSTITUTION:An emitter electrode 28 is connected to a second semiconductor layer 24 through the intermediary of a flat-surfaced polycrystalline silicon layer 27. Said polycrystalline silicon layer 27 is extended to a first semiconductor layer 23, it forms a low resistance layer 27a on the second semiconductor layer 24, and also it forms a high resistance layer 27b on the first semiconductor layer 23. As a result, no thermal fatigue is generated on the layer 27 when the emitter electrode 28 is pressure-welded, and a high reliability can be displayed. Also, as the polycrystalline silicon layer 27 has the resistance value of 1-100OMEGA between the first semiconductor layer 23 and the second semiconductor layer 24, an external resistor can be unnecessitated.
申请公布号 JPS62188266(A) 申请公布日期 1987.08.17
申请号 JP19860029312 申请日期 1986.02.13
申请人 TOSHIBA CORP 发明人 MATSUDA HIDEO
分类号 H01L29/41;H01L21/28;H01L21/331;H01L29/72;H01L29/73;H01L29/74 主分类号 H01L29/41
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