| 摘要 |
PURPOSE:To enable a wafer to be heated uniformly over the whole surface thereof, by arranging a multiplicity of heating lamps in a lattice pattern or arranging the heating lamps in combination with rod-type heating lamps for constituting a heating source. CONSTITUTION:A heating source is provided by a group of halogen lamps 2. The group of halogen lamps consists of a multiplicity of heating halogen lamps 21-2n arranged at regular intervals in a lattice pattern. The heating halogen lamps 21-2n thus arranged are received in a chamber 3 to provide a heating source for heating a wafer 5. Such arrangement of the halogen lamps 21-2n enables their outputs to be controlled independently from each other and can prevent ununiformity in temperature distribution, namely can prevent the central region of the wafer to have a higher temperature than the peripheral region. Such ununiformity could never be avoided by conventional rod-type heating lamps. |
