| 摘要 |
PURPOSE:To obtain the titled composition which is highly sensitive and does not cause staining of a pattern mask, by mixing a specified bisphenol-derived epoxy resin with a liquid epoxy compound, a photopolymerizable compound, a heat reaction catalyst, a photopolymerization initiator, etc. CONSTITUTION:The purpose liquid photopolymer composition is prepared by mixing 5-60wt% bisphenol-derived epoxy resin having at least one carboxyl group with 5-40wt% liquid epoxy compound having at least one epoxy group (e.g., etylene glycol diglycidyl ether), a photopolymerizable compound having at least one ethylenically unsaturated double bond (e.g., ethylene glcyol diacrylate), 0.01-10wt% heat reaction catalyst which can promote a heat reaction of epoxy groups (e.g., butylamine) and 0.001-15wt% photopolymerization initiator (e.g., benzophenone). |
