| 摘要 |
PURPOSE:To suppress the deposition of the components in a photoresist dissolved in a water development type photoresist developing soln. even if the concn. thereof increases and to obviate the clogging of a transfer piping by compounding a surface active agent with the above-mentioned developing soln. CONSTITUTION:The developing soln. after the development of the photoresist consisting of a water soluble resin, photopolymerizable monomer and photopolymn. initiator is treated by compounding the surface active agent (e.g., carboxylate such as acylated peptide) with said developing soln. at 0.005-5pts. wt. per 100pts.wt. developing soln. in a method for treating the above-mentioned developing soln. More specifically, the insoluble decomposed matter which is supersatd. in the waste developing soln. can be solubilized by adding the surface active agent to the waste liquid of the developing soln. in the stage of heating the same and therefore, the deposition of the insoluble decomposed matter into the waste developing soln. is obviated even if the waste developing soln. is cooled down to a room temp. Since the clogging of the transfer piping is thereby obviated, the easy treatment of the developing soln. is made possible.
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