| 摘要 |
PURPOSE:To prevent the heating of a substrate by electron bombardment and to protect the substrate by placing a magnet around the substrate so as to apply a magnetic field parallel to the substrate. CONSTITUTION:A magnet 7 is placed around a substrate 2. The magnet 7 applies a magnetic field B parallel to the surface 2a of the substrate 2 in the vicinity of the substrate 2. Free electrons e<->2 generated in a vacuum chamber 1 are trapped through lines S of magnetic force by force perpendicular to the forward direction of the electrons produced by electromagnetic induction.
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