| 摘要 |
PURPOSE:To obtain a positive type photoresist composition having flexible good film characteristics and superior adhesion to a substrate by using a combination of a specified N-(hydroxyphenyl)-maleimide-isobutylene copolymer. CONSTITUTION:The positive type photoresist composition contains the quinonediazide compound, preferably, such as naphthoquinonediazido sulfonate or benzoquinonediazido sulfonate, and the N-(hydroxyphenyl)-maleimide- isobutylene copolymer having 3 kinds of structural units each represented by formula (I)-(III), and inequalities (IV) in which 20<l/(l+m+n)<60, preferably, 25<l/(l+m+n)<60, 0.01<n/(l+m)<=10, and 0.1<=l/(l+m)<=1, where each of l, m, and n is a number of the structural units of formulae (I)-(III). |
