发明名称 FORMING METHOD FOR WIRING LAYER USING VAPOR GROWTH
摘要 PURPOSE:To prevent protruded parts yielded in Al and electromigration of Al, by holding an Al layer with high-melting point metal layers. CONSTITUTION:A substrate to be grown in placed in a reaction container. At first, a raw material gas including a high-melting metal is introduced in the reaction container. A high-melting point metal layer 25 is grown on the substrate to be grown by the thermal decomposition of the raw material gas including the high-melting point metal. Then the introduction of the raw material gas including the high-melting point metal is stopped, and organic Al and hydrogen are introduced in the reaction container. An Al layer 26 is grown on the substrate to be grown by the decomposition of the organic Al. Finally, the introduction of the organic Al and the hydrogen is stopped, and the raw material gas including the high-melting point metal is introduced in the reaction container. A high-melting point metal 27 is grown on the substrate to be grown by the decomposition of the raw material gas including the high-melting metal. Thus protruded parts yielded of the Al and the electromigration of the Al can be prevented.
申请公布号 JPS62186548(A) 申请公布日期 1987.08.14
申请号 JP19860028203 申请日期 1986.02.12
申请人 FUJITSU LTD 发明人 OBA TAKAYUKI
分类号 H01L21/3205;C23C16/18;H01L21/28;H01L21/285 主分类号 H01L21/3205
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