发明名称 ARRANGEMENT FOR ENSURING CONTACT BETWEEN RESISTANCE PATHS
摘要 An arrangement for ensuring contact between resistance paths (10) comprises a base of electrically non-conductive and elastically deformable material such as rubber. To the base (12) is applied an electrically conductive coating (16, 18, 24). The resistance path (10) is pressed against this layer by means of a covering element (36), the base (12) being subjected to preloading. In this way, the contact can be ensured between a potentiometer resistance with terminal connections (30, 32) and a plug (34), around which a short-circuit interval is provided.
申请公布号 WO8704848(A1) 申请公布日期 1987.08.13
申请号 WO1987EP00018 申请日期 1987.01.16
申请人 OELSCH KOMMANDITGESELLSCHAFT 发明人 SCHULZ, KLAUS-DIETER
分类号 H01C1/148;H01C10/08;H01C10/32;(IPC1-7):H01C1/148 主分类号 H01C1/148
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