| 摘要 |
PURPOSE:To provide a photosensitive compsn. having excellent sensitivity to light and heat resistance, etc. and suitable for use as an insulating film for semiconductor elements, photoresist, etc., by incorporating a polymer having a specified structure, an oxime compd. and a sensitizer having absorption peaks within a specified range. CONSTITUTION:A polymer (A) having a repeating unit of formula I (wherein X is a (2+n)-valent carbocyclic or heterocyclic group; Y is a (2+m)-valent carbocyclic or heterocyclic group; Z is a group of formula II or a group of formula III, etc.; R* is a group having one or more carbon-to-carbon double bonds; W is a group capable of reacting with a carbonyl group by heat- treatment to form a ring; n is 1-2; and m is 0, 1 or 2) (e.g., a 2-hydroxyethyl methacrylate/pyromellitic acid/4,4'-diaminodiphenyl ether copolymer), an oxime compd. (B) of formula IV (wherein R1, R2 and R3 are each a 1-6C alkyl, etc.) and a sensitizer (C) having absorption peaks at 250-500nm (e.g., Michler's ketone) are incorporated to obtain the desired photosensitive compsn. |
