| 摘要 |
PURPOSE:To exactly form an insulator having a large thickness in the stage of producing an electroforming matrix by superposing the insulator on a substrate, placing a mask thereon, and perpendicularly irradiating a laser, etc. thereon. CONSTITUTION:The insulator 2 is superposed on the metallic substrate 1 and the mask 3 having a pattern is placed thereon. The laser or ion beam or the like is irradiated perpendicularly thereon from above to remove the exposed part which is not masked by the insulator 2 by the laser or ion beam, etc. Since the laser or the like is perpendicularly irradiated, the exact and vertical rise of the insulator is obtd. and the insulator having the large thickness is exactly formed. The exact electroforming matrix is also manufacturable by moving the laser according to the pattern without using the mask.
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