发明名称 METHOD FOR CONTROLLING ELECTRIC CURRENT FOR ELECTROPLATING
摘要 PURPOSE:To uniformly plate a material to be plated even during reduction in the speed by controlling electric current under specified conditions. CONSTITUTION:A material 1 to be plated is passed through inlet side bridle rolls 2 and plated by passing through No.(n) plating cell 6 and No.(n-1) plating cell 5-No.1 plating cell 3 and the plated material is passed through outlet side bridle rolls 7. In accordance with reduction in the speed, electric current for each of the plating cells is reduced, and when it is reduced to a set value, electric current for the No.(n) plating cell 6 is interrupted and the speed of the material 1 at that time is held. The part of the material 1 at the inlet of the No.(n) plating cell 6 is tracked to the inlet of the No.(n-1) plating cell 5 and electric current for plating obtd. by evenly dividing electric current for the plating cell on the uppermost stream side at the time of the interruption among the remaining (n-1) plating cells is supplied to each of the plating cells 5-3 on the downstream side besides electric current for the plating cell. When the material 1 reaches the inlet of the No.1 plating cell 3, the electric current for each of the No.(n-1) plating cell 5-No.1 plating cell 3 is returned to the original value.
申请公布号 JPS62180098(A) 申请公布日期 1987.08.07
申请号 JP19860020140 申请日期 1986.02.03
申请人 NIPPON STEEL CORP;HITACHI LTD 发明人 TACHIBANA YUKIYOSHI;YOSHIDA SHINICHI;KOMATSU NOBUKATSU;SUGAWARA HIROSHI
分类号 C25D21/12;C25D7/06 主分类号 C25D21/12
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