GLOW DICHARGE DECOMPOSITION DEVICE

摘要

PURPOSE:To prevent the corrosion of a substrate base with an etching gas by using the substrate as an electric discharge electrode in the stage of gasifying and removing the Si powder generated when an amorphous silicon film is formed by glow discharge of a gaseous raw material onto a substrate by the electric discharge of the etching gas. CONSTITUTION:A photosensitive drum to be formed with the amorphous silicon film is removed and after a substrate 8 for a dummy having the same shape is disposed to a substrate support 3 in place of the drum, the etching gas is supplied from etching gas ejection ports 6 of an electrode plate 5 for glow discharge to the inside of a reaction chamber 1 to generate the glow discharge between the same and the plate 5 and to gasify and remove the Si powder in the stage of removing the Si powder generated simultaneously when the amorphous silicon film is formed by the glow discharge of the gaseous raw material in the reaction chamber. Since the support 3 is not used as the electrode for glow discharge, the corrosion thereof by the etching gas is obviated.