发明名称 Process and apparatus for eliminating residual monomers in packaging film by electron bombardment
摘要 The present invention relates to a process for eliminating residual monomers in packaging films by electron bombardment, in which the bombardment is carried out with low-energy electron beams in the range from 150 to 300 kV accelerating voltage using an electron gun having a large-area electron exit window. The apparatus for carrying out the process specified above comprises an electron gun for generating low-energy electron beams in the range from 150 to 300 kV accelerating voltage having a large-area electron exit window and a drum which is arranged in front of the electron exit window and on which the film material to be bombarded is taken past the electron-beam window.
申请公布号 DE3602865(A1) 申请公布日期 1987.08.06
申请号 DE19863602865 申请日期 1986.01.31
申请人 POLYMER-PHYSIK GMBH & CO KG 发明人 GOTTFRIED,DIPL.-CHEM.DR. REUTER,FRANZ
分类号 B29C35/08;B29C71/04;(IPC1-7):B29C71/04 主分类号 B29C35/08
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