发明名称 PHOTOCURABLE RESIN COMPOSITION
摘要 PURPOSE:To increase the hardness of a product cured by irradiation with light, by using a specified amino polymer in the titled composition comprising an ethylenically unsaturated monomer, an aromatic ketone and an amine. CONSTITUTION:A photopolymerization initiator is prepared by mixing an aromatic ketone (A) (e.g., benzophenone or acetophenone) with an amino polymer (B) of formula I or II (wherein R1 and R2 are each H or methyl, R3 and R4 are each a lower alkyl, m is 1-4 and n is a positive integer). This photopolymerization initiator is mixed with an ethylenically unsaturated monomer (e.g., methyl acrylate or polyethylene glycol monoacrylate) to obtain the purpose photocurable resin composition. The polymers of formula I or II can be obtained by polymerizing an amine having an ethylenically unsaturated group (e.g., dimethylaminethyl methacrylate).
申请公布号 JPS62179507(A) 申请公布日期 1987.08.06
申请号 JP19860020467 申请日期 1986.02.01
申请人 NIPPON PAINT CO LTD 发明人 SHIROTA YASUHIKO;KAWABATA MASAMI
分类号 C08F2/50;C08F20/34;C08F20/52;C08F220/34;C08F220/60 主分类号 C08F2/50
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