发明名称 |
PRODUCTION OF 1,2-QUINONEDIAZIDE COMPOUND |
摘要 |
PURPOSE:To obtain the titled compound useful as a positive-type resist sensitive to radiation when used together with an alkali-soluble resin, by reacting a polyhydroxyl compound with an acylation agent, a sulfonylation agent and a 1,2-quinonediazidation agent. CONSTITUTION:The objective compound can be produced by reacting a part of hydroxyl groups of a polyhydroxyl compound with an acylation agent (e.g. acetyl chloride) and/or sulfonylation agent (e.g. methanesulfonic acid chloride) at 0-40 deg.C and reacting a part of or whole remaining hydroxyl group of the polyhydroxyl compound with e.g. a 1,2-quinonediazidation agent at 0-40 deg.C. The total amount of the acylation agent, sulfonylation agent and 1,2- quinonediazidation agent is >=0.3mol per 1g-equivalent of the hydroxyl group of the polyhydroxyl compound. |
申请公布号 |
JPS62178562(A) |
申请公布日期 |
1987.08.05 |
申请号 |
JP19860016892 |
申请日期 |
1986.01.30 |
申请人 |
JAPAN SYNTHETIC RUBBER CO LTD |
发明人 |
HOSAKA YUKIHIRO;NOZUE IKUO;OKA HITOSHI;HARITA YOSHIYUKI |
分类号 |
G03C1/72;C07C67/00;C07C301/00;C07C303/28;C07C309/63;C07C309/76;C07C311/00;C07D311/28;C07D311/30;G03F7/022;H01L21/30 |
主分类号 |
G03C1/72 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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