| 摘要 |
PURPOSE:To obtain a sample processing equipment which can obtain uniform thickness of thin film formed by photo-CVD method and improvement of uniform etching by light etching by using single light source which emits uniform light on a constant plane. CONSTITUTION:In a thin film forming container 1, a sample tray 3 on which a sample 2 consisting of, e.g. a glass substrate is housed. In the sample tray 3, a heater 4 for heating the above-mentioned sample 2 is provided and a raw material gas including a compound gas is introduced into the container 1 from a gas supply 5. On the top of the thin film forming container 1, a light source container 8 which houses a light source 7 is installed. The light source 7 is made of a spiral luminescent region discharge lamp and the light energy radiated from the discharge lamp passes a window 9 and enters into the above-mentioned container 1. This enables uniform irradiation of light into the container 1 and thin film forming of uniform thickness by photo-CVD method. |
