| 摘要 |
PURPOSE:To maintain superior developability and the characteristics of low sensitivity in the visible light region and to enhance a sensitivity to fog ratio by incorporating at least one of specified compounds in at least one of photosensitive silver halide emulsion layers and silver chloride grains in a silver halide composition. CONSTITUTION:At least one of the photosensitive silver halide emulsion layers contains at least one of the compounds represented by formula (1)-(6) in which each of R1-R3 is H, halogen or the like; X is a group obtained by removing one H atom from one of R1-R3 and OH groups of one of formulae (1)-(4); J is a divalent bonding group; Y is H, amino, or the like; Z is N, S, or O; and when Z is N, n is 1, and when Z is S or O, n is 0. The silver halide composition consists substantially of silver chloride grains, and they are contained in an amount of >=97mol%, preferably, >=99mol%, thus permitting high-speed processability and the sensitivity to fog ratio to be enhanced. |
