| 摘要 |
PURPOSE:To stabilize developing speed by adjusting an amount of byproduct in a developing solution to be separated by the ion chromatography to the range of 0.5-15% by the area measured by the electric conductivity detector. CONSTITUTION:The developing solution to be used for a positive type photoresist containing a quinonediazido compound contains the reaction product between trimethylamine and ethylene oxide, and an amount of the byproduct in the developing solution to be separated by the ion chromatography is controlled to the range of 0.5-15% by the area measured by the electric conductivity detector. The positive type photoresist is composed of an alkali-soluble resin and the photosensitive quinonediazido compound which is insoluble in alkali in a state unexposed to ultraviolet rays, but when it is exposed to ultraviolet rays, it increases in the alkali-solubility, accordingly, it is made impossible to restrain the dissolution of the alkali-soluble resin, and all the parts of the exposed areas dissolve in the alkaline developing solution, thus permitting the obtained positive type photoresist developing solution to be superior in stability of the developing speed. |
