发明名称 VAPOR GROWTH DEVICE
摘要 PURPOSE:To conduct uniform heating while easily equalizing the film thickness and resistivity of a growth layer by mounting a drive transmission section for turning base bodies outside the region of a heating section while forming sheet type structure in which the base bodies are processed one by one. CONSTITUTION:A susceptor 30 on which a base body 20 is placed is housed in a reaction vessel 10, and a gas supply nozzle 40 and an exhaust nozzle 50 are fitted near the base body 20. Heaters 70, 71 are each installed on the upper side and lower side of the reaction vessel 10, and infrared ray lamps 700, 710 are arranged in response to the base body. A rotating drive transmission section 800, rotary rings 810 and ring guides 820, 830 in a rolling mechanism section horizontally turning the base body are set up outside a radiation heating region. A plurality of base bodies 21 set into a spare chamber 100 are set onto the susceptor 30 one by one by using a carrying mechanism 200. The base body is set, the rolling mechanism is operated, and the base body is turned in the horizontal direction. The base body heated by the infrared ray lamps 700, 710 is vapor grown by a raw material gas fed by the supply nozzle.
申请公布号 JPS62177912(A) 申请公布日期 1987.08.04
申请号 JP19860017942 申请日期 1986.01.31
申请人 HITACHI LTD 发明人 AKIYAMA NOBORU;INOUE HIRONORI;OGAWA SABURO;OGAMI MICHIO;SUZUKI TAKAYA
分类号 H01L21/205 主分类号 H01L21/205
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