| 摘要 |
PURPOSE:To form a thin metallic film having excellent purity and accuracy on a substrate in a vacuum by impulsively irradiating acceleration ions in the stage of irradiating a metal for vapor deposition and acceleration ions and forming the thin metallic film on the substrate. CONSTITUTION:The substrate 2 to be treated is placed in a vacuum vessel 1 and the acceleration ions 11 by the plasma generated in an ion source 3 are irradiated thereto. The metal for vapor deposition is evaporated at the same instant by an electron gun 4 which irradiates the generated evaporating metal 51 to the substrate 2 thereby forming the thin film consisting of the evaporating metal on the substrate. The temp. of the substrate 2 is measured by a temp. measuring instrument 8 which inputs the signal thereof to a power source 6 for the ion source 3 having a high-speed switch to control the ion source. A pulse signal is fed to the ion source 3 and at the same time, the thermion emission quantity of the electron gun 4 and a shutter 9 are cooperatively operated by an electron gun control device 7 by which the thin metallic film having the high purity and accuracy is formed on the surface of the substrate 2.
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