发明名称 ICP EMISSION SPECTROSCOPIC ANALIZING METHOD
摘要 PURPOSE:To secure plasma lighting, by adding a sequence of cleaning of the inside of a plasma torch by using ionizing plasma gas. CONSTITUTION:In the sequence of performing automatic lighting of plasma torch 2, a plasma gas flows for a specified time before a high frequency power is supplied to an induction coil 10 from a high frequency power source 14. Under such a condition, a Tesla coil 6 for igniting a plasma gas is put into operation and a sequence of introducing plasma gas into the torch 2 is added. Then, after cleaning of the inner wall of the torch 2, a high frequency power is fed into the coil 10 from the power source 14 and ionizing gas is plasma lighting. This enables maintaining of the purity of argon gas at the plasma lighting thereby securing lighting.
申请公布号 JPS62175650(A) 申请公布日期 1987.08.01
申请号 JP19860018442 申请日期 1986.01.30
申请人 SHIMADZU CORP 发明人 HIROMICHI HITOSHI;OKADA KOJI
分类号 G01N21/73 主分类号 G01N21/73
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