| 摘要 |
PURPOSE:To prevent the attachment of dust from a lifting mechanism to a wafer, by providing a mounting stage of a wafer carrier at the uppermost part, providing a base body under the stage in a separated manner, thereby constituting an elevator main body, providing the lifting mechanism in the elevator beneath a carrier stage, and lifting and lowering the mechanism together so that the wafer does not face the lifting mechanism. CONSTITUTION:A conveyer 43 is moved based on an external command. When a wafer 3 at the lowest position is carried out, a motor 55 in a driving means 54 is immediately started. An elevator main body 31 begins to descend with a feed screw 45. Thus a wafer carrier 6 is also lowered. The next wafer 3 is detected by a detecting means 33 and the carrier is stopped. The elevator main body 31 is stopped under the state the next wafer is mounted on the conveyer. On the other hand, when the wafer carrier 6 is located at the lowest position and the carrier is vacant, the wafer carrier is lifted by only one pitch when the wafer 3 is carried in a supporting groove 2 at the uppermost stage. Thus the wafers 3 are sequentially accommodated. Therefore, the lifting mechanism is always located at the position lower than the wafer carrier and does not face the wafers in the wafer carrier. Thus the wafers are not exposed to dust of the lifting mechanism.
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