摘要 |
PURPOSE:To decrease the ununiformity of the damage of the titled target obtd. by providing a magnetic field impressing means for impressing a magnetic field in one direction to the target. CONSTITUTION:The magnetic field impressing means such as permanent magnet 19 to impress the magnetic field in one direction to the target 15 is provided in addition to the permanent magnet 17 to form a tripolar sputtering source, to decrease the ununiformity of the horizontal magnetic field orthogonal to the electric field on the target 15. The damage of the target 15 conspicuous near the magnet 17 as compared to the center of the target 15 are thereby made uniform. The magnetic field impressing means is preferably platy or U-shaped permanent magnets 19, 21 or an electromagnet formed by subjecting a U-shaped high permeability magnetic material 22 to winding 23.
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