| 摘要 |
PURPOSE:To form a uniform film on a bottomed pipe, especially on the inside of the pipe by dividing the bottomed pipe into parts each having a simple shape, forming films on the parts by a vapor growth method, assembling the parts and forming a film on the joint to carry out hermetical sealing. CONSTITUTION:When desired films are formed on a cylindrical substrate 1 and a lid-shaped substrate 2 to be fitted to one of the open ends 3 of the substrate 1 by a vapor growth method such as thermal CVD or plasma CVD, the substrates 1, 2 are separately placed in a reactor so that a reactive gas 4 flows uniformly and films are uniformly formed. the substrates 1, 2 having formed films 5 are assembled into a bottomed pipe 7 in a fitting state and a film 8 is further formed on at least the joint 6 by a vapor growth method. Hermetical sealing and joining are simultaneously carried out by forming the film 8.
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