| 摘要 |
PURPOSE:To improve the yield of a target by forming only the parts of the target undergoing practical erosion with a material to be sputtered and the remaining part with a harmless material. CONSTITUTION:A sputtering target is used for sputtering by which ion beams are irradiated on a solid sample to sputter part of the surface of the sample in vacuum. The parts of the target undergoing practical erosion by sputtering are formed with a prescribed material 12 to be sputtered and the remaining part 13 is formed with a material which causes no problem even when sputtered. |
