| 摘要 |
PURPOSE:To form a high-accuracy pattern and to suppress the generation of hillocks, etc., by using a phenol novolak resin as a thin org. high-polymer film thereby suppressing a standing wave effect. CONSTITUTION:Three-layered resists are formed on a substrate 1 by successively laminating the thin org. high-polymer film 2, a thin intermediate layer film 3 and a thin resist film 4 on the substrate. A UV resist is applied to the thin film 2, an inorg. high polymer to the thin film 3, and a UV resist, electron ray resist, X-ray resist, etc., are applied to the thin film 4. Then the thin film 2 effectively flatten the steps of the substrate and the thin film 4 is uniformly coated. The pattern having excellent dimensional accuracy is thus obtd. regardless of the pressure or absence of the substrate. |
