发明名称 ELECTRON BEAM LITHOGRAPHY EQUIPMENT
摘要 PURPOSE:To form a mark, a position thereof can be detected, and to improve the precision of drawing by detecting secondary electrons, reflected electrons or the like when electron beams are scanned to a laser mirror. CONSTITUTION:Marks 23, 24 receiving electron beams are fixed to removed sections in laser mirrors 21, 22 while the position of the upper surfaces of the marks are equalized to the drawing of a material to be drawn 13. The laser mirrors 21, 22 are irradiated by lasers in the X axis direction and the Y axis direction, thus measuring the position of an XY stage. Electron beams are scanned to the marks 23, 24 from the vertical direction to a paper surface, the positions of the marks are measured from signal waveforms by the reflected electrons, secondary electrons or the like of the electron beams, and process is repeated, thus detecting the quantities of drifts. Accordingly, the precision of drawing is improved.
申请公布号 JPS62173714(A) 申请公布日期 1987.07.30
申请号 JP19860015315 申请日期 1986.01.27
申请人 TOSHIBA MACH CO LTD 发明人 IWASE AKIRA
分类号 H01J37/305;H01L21/027;H01L21/30 主分类号 H01J37/305
代理机构 代理人
主权项
地址
您可能感兴趣的专利