| 摘要 |
PURPOSE:To manufacture a superconducting element having no shortcircuit nor open with high reliability in high yield by forming superconducting electrodes and a barrier layer by reactive etching with chlorine gas. CONSTITUTION:Nb or ZrN to become a lower electrode 12, an Al2O3 or ZrO2 to become a barrier layer 13 and an NbN or ZrN to become an upper electrode 14 are sequentially laminated on a substrate 11, patterned by a resist mask as required, and an electrode section and a barrier section are formed in desired shapes by reactive etching with chlorine gas. Then, an SiO is deposited as an interlayer insulating film 15, and a wiring layer 16 made of Nb film is formed. Thus, a superconducting element having no adhered material or residue is formed with high reliability in high yield.
|
