| 摘要 |
<p>PCT No. PCT/GB86/00668 Sec. 371 Date Aug. 28, 1987 Sec. 102(e) Date Aug. 28, 1987 PCT Filed Oct. 29, 1986 PCT Pub. No. WO87/02750 PCT Pub. Date May 7, 1987.A gas handling manifold for use in metal-organic chemical vapor deposition systems, the manifold having a radial configuration with each vent/run valve equidistant from the center. Ensuring that gases switched simultaneously arrive in a reactor vessel substantially simultaneously, alleviating problems caused by intermediate reactions in the manifold. The manifold has minimal unflushed area (dead volumes) allowing incompatible materials to be handled in tandem.</p> |
