发明名称 SEMICONDUCTOR DEVICE AND PROCESS FOR PRODUCING THE SAME
摘要 <p>SEMICONDUCTOR DEVICE AND PROCESS FOR PRODUCING THE SAME A semiconductor device having an ohmic electrode which has formed on the surface of a p-type III-V compound semiconductor an assembly of a first Ti layer, a second Zn layer, a third metal layer made of one element selected from among Pt, Mo, W and Cr, and a fourth Au layer is disclosed. A process for producing such semiconductor device is also disclosed. The present invention provides a novel ohmic electrode having a low contact resistance comparable to that of a conventional electrode formed by deposition of successive Au, Zn and Au layers. The novel electrode also has the advantage of another conventional electrode wherein the Au electromigration is held to a minimum by forming an assembly of a Ti layer, a metal layer made of an element selected from among Pt, Mo, W and Cr, and an Au layer.</p>
申请公布号 CA1224886(A) 申请公布日期 1987.07.28
申请号 CA19850475424 申请日期 1985.02.28
申请人 SUMITOMO ELECTRIC INDUSTRIES, LTD. 发明人 HIMOTO, TAKESHI
分类号 H01L21/28;H01L21/285;H01L29/43;H01L29/45;(IPC1-7):H01L21/28;H01L29/40 主分类号 H01L21/28
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