PHOTOGRAPHIC SENSITIVE MATERIAL

摘要

PURPOSE:To obtain the titled material having an excellent antisticking property and antistatic property by incorporating a graft polymer and/or a block polymer which contains a fluorine atom unit to one layer of nonphotosensitive layers. CONSTITUTION:In the title material which has at least one layer of the photosensitive layer on a surface of the substrate body, and at least one layer of the nonphotosensitive layer on the substrate which is an opposite side of the substrate provided with the photosensitive layer thereon, at least one layer of the nonphotosensitive layers contains the polymer and/or the copolymer having the fluorine atom unit. The prescribed fluorine atom unit contd. in the polymer is a polymer chain composed of the monomer units contg. fluorine atom. The representative unit is exemplified by the monomer shown by the formula. The content of the fluorine unit contd. in the polymer is >=1wt% fluorine atom. The titled material having a sufficient antistatic and antisticking properties is obtd. If the content is >=90wt%, the titled material having a less solubility against org. solvents and being difficult to handle, is obtd.