发明名称 SPINNER UNIT FOR SEMICONDUCTOR MANUFACTURING APPARATUS
摘要 PURPOSE:To improve the maintainability of a semiconductor manufacturing apparatus by stopping a vacuum evacuation hole of a spin shaft at the intermediate portion, forming a connecting hole in a housing, forming a vacuum sealing portion, and providing a pipe port for evacuating in vacuum on the outer surface. CONSTITUTION:When a vacuum pump 35 is driven to evacuate in vacuum by a piping system 31 connected with a pipe port 30 of a housing 17 as by an arrow B, vacuum pressure is supplied from the connecting hole 33 of a spin chuck 15 via a through hole 29 in the housing 17, a connecting hole 25, a vent hole 24 in a spin shaft 15 and a vacuum suction hole 20 to the upper surface recess 32 as designated by arrows C, D, E, and the chuck 15 attracts and holds the work 2 by vacuum. When a drive motor 18 is driven to rotate a rotational shaft 22 in the state that the work 2 is attracted by vacuum, a rotary driving force is transmitted to the shaft 16, also acted on the chuck 15, and the chuck 15 rotates while attracting by vacuum the work 2. The work 2 is processed as required in this state.
申请公布号 JPS62166516(A) 申请公布日期 1987.07.23
申请号 JP19860008030 申请日期 1986.01.20
申请人 HITACHI ELECTRONICS ENG CO LTD 发明人 UMENO RYUTARO
分类号 H01L21/306;B05C11/08;G03F7/16;H01L21/027;H01L21/30;H01L21/304;H01L21/67;H01L21/68;H01L21/683 主分类号 H01L21/306
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