| 发明名称 |
Photosensitive resin composition. |
| 摘要 |
<p>Disclosed herein is a photosensitive resin composition composed mainly of an alkali-soluble organometallic polymer and a photosensitive dissolution inhibitor. The composition is used as a positive type resist which can be developed with an alkali developing solution. The resist has high sensitivity, high resolution, and resistance to oxygen plasma.</p> |
| 申请公布号 |
EP0229629(A2) |
申请公布日期 |
1987.07.22 |
| 申请号 |
EP19870100100 |
申请日期 |
1987.01.07 |
| 申请人 |
HITACHI, LTD. |
发明人 |
SUGIYAMA, HISASHI;NATE, KAZUO;INOUE, TAKASHI;MIZUSHIMA, AKIKO |
| 分类号 |
G03C1/675;G03C1/72;G03C1/00;G03F7/022;G03F7/039;G03F7/075;G03F7/11;G03F7/26;H01L21/027;(IPC1-7):G03F7/10 |
主分类号 |
G03C1/675 |
| 代理机构 |
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代理人 |
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| 地址 |
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