| 摘要 |
PURPOSE:To conduct precise thermal diffusion treatment by constituting an silica trough at the same curvature as an silica tube and washing a foreign matter adhering on the silica trough. CONSTITUTION:With an silica trough 20, a section takes an arcuate shape at the same curvature as an silica tube 3, length is longer than an silica boat 5, and it is formed by quartz. The boat 5 on which wafers 6 are formed in line in an orderly way is housed in the silica tube 3 under the state in which the boat is placed on the silica trough 20. Consequently, the boat 5 is put on the silica trough 20, and a lower section in the silica tube 3 is brought to the state in which the lower section is covered with the silica trough 20, thus resulting in an adhesion on the surface of the silica trough 20 of reaction flakes generated through thermal diffusion treatment. Since thermal diffusion treatment is executed continuously, the boat 5 is inserted into the silica tube 3 by an auto-loader, etc., but only the silica trough 20 is brought into contact with the silica boat 5, thus resulting in an adhesion on the silica trough 20 of foreign matters generated by friction. Accordingly, when only the contiminated silica trough 20 is washed, the degree of washing in the silica tube 3 is ensured, thus resulting in precise thermal diffusion treatment.
|
