EXPOSURE DEVICE

摘要

PURPOSE:To attain alignment with high precision by using a beam splitter and an image intensifier for amplifying an image and converting a wavelength and directly aligning a reticle and a wafer by excimer laser beams, etc. CONSTITUTION:The image of beams in an ultraviolet zone close to a wavelength such as 250nm can be caught regarding an alignment mark on a reticle 5 and an alignment mark on a wafer 9 through a beam splitter 6 of beams from an alignment lighting system 14. Reflected beams from the alignment marks return the images of the alignment marks on the wafer 9 and the reticle 5 to a lens 10 for alignment through the splitter 6. The images on the wafer 9 and the reticle 5 are changed into images expanded by a reducing projection lens 7 and the lens 10, thus acquiring extremely large resolution.