发明名称 PLASMA X-RAY SOURCE
摘要 PURPOSE:To prevent a discharge between a metallic valve body and a coil, by linking a driving coil housing of a valve to an insulating gas chamber, and keeping the coil housing airtight to a plasma material gas flow passage. CONSTITUTION:The first insulating gas chamber 28 is linked to the second insulating gas chamber 29 which is composed to surround the outside of a housing 23 by a cylindrical body 22, and a housing of a coil 4 composed of an inner tube 23a and an outer tube 23b is linked to the insulating gas chamber 29 through a gap 30 where the inner tube 23a and the outer tube 23b opposes each other. To a pipe 31 to feed a plasma material gas to a plasma material gas chamber 24, O rings are inserted to all engaging parts. When a current is applied to the coil 4, a valve body 5 is pressed up impulsively, and the plasma material gas is injected into the plasma forming chamber to form a plasma gas column. When a discharge voltage is applied to an anode 2 and a cathode 3, X-rays generated from the gas column are emitted through an aperture 15 to a sample chamber 1. Then, the insulating gas flows in the housing of the coil 4, and no discharge occurs between the coil 4 and the valve body 5 because the insulation of the coil 4 is perfect.
申请公布号 JPS62165842(A) 申请公布日期 1987.07.22
申请号 JP19860006766 申请日期 1986.01.16
申请人 FUJITSU LTD 发明人 KITAMURA YOSHITAKA;YAMABE MASAKI;FURUKAWA YASUO
分类号 H05G2/00;H01J35/22;H05G1/00 主分类号 H05G2/00
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