发明名称 APPARATUS FOR CONTROLLING INJECTION OF GAS
摘要 PURPOSE:To make it possible to control the outflow and inflow of an extremely minute amount of gas, in a portable gas chromatograph, by providing a gas passage to the recessed part of a silicon wafer and using a membrane as the control valve of said passage. CONSTITUTION:A recessed part 1a is formed to a silicon wafer 1, and a valve seat 1b and a piercing hole 1c are provided to said recessed part 1a. Further, a glass plate 2 is closely adhered to the back surface of the silicon wafer 1 and a piercing hole 2a is provided to be communicated with the piercing hole 1c, and a membrane 3 and a buffer member 4 are provided on the silicon wafer 1. Then, a cylinder 8 is pushed down and contacted with the buffer member 4 to downwardly bend the membrane 3 which is, in turn, pressure to the valve seat 1b to enable the closing of the piercing hole 1c. By this method, the flow amount of gas passing through the recessed part 1a is controlled. Because the membrane is used as a control valve, an extremely minute flow amount of the gas is regulated and the control valve can be manufactured easily.
申请公布号 JPS62161050(A) 申请公布日期 1987.07.17
申请号 JP19850200803 申请日期 1985.09.11
申请人 SORD COMPUT CORP 发明人 HAGIWARA SHIYOUSUKE;MAJIMA HIROYUKI
分类号 G01N30/32;B01D15/08;F16K7/16;F16K7/17 主分类号 G01N30/32
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