发明名称 PRODUCTION OF CERAMIC SPUTTERING TARGET
摘要 PURPOSE:To easily produce a large-sized target whose density is close to the theoretical density by melting and solidifying ceramic powder by water plasma spraying. CONSTITUTION:Powder of ZrO2, SiO2, Ta2O5, TiO2, Al2O3, Fe2O3 or other ceramics contg. such compounds as the principal components is prepd. The desired ceramic powder is fed to a plasma jet from a feed pipe 5, sprayed on a material such as a backing plate 6 with the plasma jet and built up. The resulting formed body is a sputtering target having the theoretical density. When the target is used, sputtering efficiency is improved. The target is hardly broken or cracked during sputtering.
申请公布号 JPS62161945(A) 申请公布日期 1987.07.17
申请号 JP19850180973 申请日期 1985.08.20
申请人 TOYO SODA MFG CO LTD;OFIC CO 发明人 SAKURAI TETSUO;HONDA AKIRA
分类号 C23C4/10;C23C14/34 主分类号 C23C4/10
代理机构 代理人
主权项
地址
您可能感兴趣的专利