RESIST COMPOSITION

摘要

PURPOSE:To obtain a resist composition having superior resolution and contrast by using a prescribed amount of alkyl substituted phenol novolak resin having a prescribed number average mol.wt. and a prescribed amount of specified polyolefin sulfone resin. CONSTITUTION:This resist composition contains 50-98pts.wt alkyl substituted phenol novolak resin (A) having alternately bonded phenol and methylene groups and 50-2pts.wt. polyolefin sulfone resin (B). The resin A is obtd. by polycondensing phenol having 1-9C alkyl groups as substituents at the o- or p-positions with formaldehyde in the presence of an acid catalyst in a specified polar org. solvent. The resin A has >=1,500 number average mol.wt. measured by a vapor pressure method using dimethylacetamide as a solvent. The resin B is a copolymer contg. SO2 and 3-15C olefinic monomer having a copolymerizable double bond and has 1.3-0.95 molar ratio of olefin/SO2 and 10<4>-10<8> weight average mol.wt.