| 发明名称 |
A BASE PRECURSOR FOR HEAT-DEVELOPABLE PHOTOSENSITIVE MATERIAL |
| 摘要 |
A base precursor for heat-developable photosensitive material is disclosed. The precursor is comprised of a compound represented by general formula (I) or (II): (R-C 3BOND C-CO2H)x.B (I) R-C 3BOND C-CO2H)2.By (II) The substituents within the general formulae are defined within the specification. The use of this novel base precursor makes it possible to obtain a material which is very stable at normal temperatures and which smoothly decomposes under heating at 80 DEG C. or higher in order to release a basic constituent. |
| 申请公布号 |
DE3464165(D1) |
申请公布日期 |
1987.07.16 |
| 申请号 |
DE19843464165 |
申请日期 |
1984.03.30 |
| 申请人 |
FUJI PHOTO FILM CO., LTD. |
发明人 |
SATO, KOZO;HIRAI, HIROYUKI |
| 分类号 |
C07C51/347;C07C57/18;C07C57/20;C07C57/22;C07C57/26;C07C57/42;C07C57/52;C07C57/60;C07C59/64;C07C59/76;C07C59/84;C07C205/56;C07D211/26;C07D211/58;C07D211/72;C07D213/55;C07D213/73;C07D213/74;C07D215/12;C07D233/06;C07D239/06;C07D263/56;C07D277/40;C07D277/64;C07D333/24;C07D333/28;G03C1/06;G03C1/42;G03C1/498;G03C1/52;G03C1/61;G03C5/18;G03C8/40;(IPC1-7):G03C1/02;G03C1/60;C07C129/00 |
主分类号 |
C07C51/347 |
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