发明名称 |
LASER INTERFEROMETRY IMAGING PROCESS AND LASER INTERFEROMETER |
摘要 |
A laser interferometry process for etching thin layers, in which a layer to be examined is irradiated with a laser and the intensity of the reflected laser beam is determined and analysed. The reflected laser beam is composed of a beam which is reflected by the top surface and a beam which is reflected by the lower boundary surface of the layer to be examined. The laser beam scans a determined area of the layer to be examined and the intensity of the reflected laser beam is entered in a data processing system able to reproduce the information about the layer to be examined. An imaging laser interferometer comprises a modulator for deflecting the laser beam, a detector for the reflected laser beam and a data processing system for processing the signals of the detector. |
申请公布号 |
WO8704237(A1) |
申请公布日期 |
1987.07.16 |
申请号 |
WO1987DE00002 |
申请日期 |
1987.01.08 |
申请人 |
FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWAND |
发明人 |
BETZ, HANS;MADER, HERMAN;PELKA, JOACHIM |
分类号 |
G01B11/06;(IPC1-7):G01B11/06 |
主分类号 |
G01B11/06 |
代理机构 |
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代理人 |
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地址 |
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