发明名称 DEVELOPING SOLUTION COMPOSITION FOR PHOTOSENSITIVE LITHOGRAPHIC PLATE AND DEVELOPING METHOD
摘要 PURPOSE:To obtain a developing solution high in development capacity and capable of obtaining always stable results by incorporating at least one of inorganic acids, organic acids, and their salts in an aqueous alkaline solution containing an alkaline agent, an organic solvent, and at least one of anionic surfactants and sulfites. CONSTITUTION:The developing solution is prepared by adding at least one of carbonic acid, phosphoric acid, hydrochloric acid, sulfuric acid, nitric acid, organic acids, and their salts into the alkaline solution containing at least one kind of alkaline agent selected from silicates, alkali metal hydroxides, quaternary ammonium hydroxides, and organic amines, the organic solvent having a solubility of <=10wt% in water at 20 deg.C, and at least one of anionic surfactants and sulfites, thus permitting the obtained developing solution composition to exhibit stable development performance even in the case of processing a large number of negative type and positive type PS plates with an automatic developing machine for a long time and high in developing capacity and unchangeable in development performance.
申请公布号 JPS62159148(A) 申请公布日期 1987.07.15
申请号 JP19860001799 申请日期 1986.01.07
申请人 KONISHIROKU PHOTO IND CO LTD 发明人 UEHARA MASABUMI;NOGAMI AKIRA;KIYONO MINORU;NAKANO MIEJI
分类号 G03F7/00;G03F7/30;G03F7/32 主分类号 G03F7/00
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