发明名称 Plasma smelting process for silicon
摘要 What is disclosed is a process for preparing silicon using a gas plasma as a heat source. The process comprises (a) generating a gas plasma in a reactor utilizing a transferred arc plasma configuration in which a minimum of gas is utilized to form a plasma; (b) feeding silicon dioxide and a solid reducing agent directly into the reactor and to the plasma; (c) passing the plasma gas, the silicon dioxide, and the solid reducing agent into a reaction zone of the reactor; (d) recovering molten silicon and the gaseous by-products.
申请公布号 US4680096(A) 申请公布日期 1987.07.14
申请号 US19850813330 申请日期 1985.12.26
申请人 DOW CORNING CORPORATION 发明人 DOSAJ, VISHU D.;RAUCHHOLZ, ALVIN W.
分类号 C01B33/02;C01B33/023;C01B33/025;(IPC1-7):C01B33/02 主分类号 C01B33/02
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